Share Email Print
cover

Proceedings Paper

Analysis of a low-aspect phase defect for actinic EUVL mask blank inspection
Author(s): Takeshi Yamane; Tomohisa Ino; Hiroki Miyai
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A high-volume manufacturing (HVM) actinic blank inspection (ABI) prototype could detect a printable phase defect for 16 nm node at almost 100 % of the capture rate. However, although a printable phase defect where the aspect ratio was lower than 0.01 was hardly existed, it was not detected by the HVM ABI prototype. For the purpose that could detect the low-aspect phase defects, scattered light angle from the defect was analyzed. As the result of analysis, an enlargement of the illumination NA was found to enhance the signal intensity of a low-aspect phase defect without any significant influence to the noise signal. The illumination optics of the HVM ABI prototype was improved and the illumination NA was enlarged from 0.07 to nearly 0.1. It was demonstrated that the low-aspect phase defect became to be detectable by the HVM ABI prototype, and no negative influence to other defects was found.

Paper Details

Date Published: 9 July 2015
PDF: 8 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580N (9 July 2015); doi: 10.1117/12.2197502
Show Author Affiliations
Takeshi Yamane, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tomohisa Ino, Lasertec Corp. (Japan)
Hiroki Miyai, Lasertec Corp. (Japan)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

© SPIE. Terms of Use
Back to Top