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Proceedings Paper

Grid-supported EUV pellicles: A theoretical investigation for added value
Author(s): Florian Dhalluin; Laurens de Winter; Luigi Scaccabarozzi; Jack Van der Sanden; Sven Lentzen; Rob Van Gils; Maurice Bogers; Erik Ruinemans; Derk Brouns; Juan Diego Arias Espinoza; Mária Péter; Daniel Smith; Wim Van der Zande; Hans Vermeulen
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Paper Abstract

EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the strength of the ultrathin membranes, grid-supported pellicle membranes have been proposed. In this study we compare grid-supported pellicles (GSP) over free-standing pellicles (FSP). We considered imaging, thermal, mechanical, and thermo-mechanical characteristics. Finite Element Methods (FEM) was used to investigate the thermal, and (thermo-)mechanical behavior of pellicles. The maximum temperature reached under operational conditions by the pellicle film was determined. Using a thermo-mechanical analysis wrinkling behavior was quantified. The mechanical analysis considered the influence of grid structures on the sagging behavior, on crack propagation, on the pellicle film resistance to collision with solid particles, and on the resistance to shocks on the pellicle frame. The analysis shows that GSP that meets imaging requirements will not bring any advantages over FSP.

Paper Details

Date Published: 9 July 2015
PDF: 11 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580J (9 July 2015); doi: 10.1117/12.2197454
Show Author Affiliations
Florian Dhalluin, ASML Netherlands B.V. (Netherlands)
Laurens de Winter, ASML Netherlands B.V. (Netherlands)
Luigi Scaccabarozzi, ASML Netherlands B.V. (Netherlands)
Jack Van der Sanden, Philips Innovation Services (Netherlands)
Sven Lentzen, Philips Innovation Services (Netherlands)
Rob Van Gils, Philips Innovation Services (Netherlands)
Maurice Bogers, MI-Partners BV (Netherlands)
Erik Ruinemans, MI-Partners BV (Netherlands)
Derk Brouns, ASML Netherlands B.V. (Netherlands)
Juan Diego Arias Espinoza, ASML Netherlands B.V. (Netherlands)
Mária Péter, ASML Netherlands B.V. (Netherlands)
Daniel Smith, ASML Netherlands B.V. (Netherlands)
Wim Van der Zande, ASML Netherlands B.V. (Netherlands)
Hans Vermeulen, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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