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Proceedings Paper

Sensitivity analysis for high accuracy proximity effect correction
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Paper Abstract

A sensitivity analysis (SA) algorithm was developed and tested to comprehend the influences of different test pattern sets on the calibration of a point spread function (PSF) model with complementary approaches. Variance-based SA is the method of choice. It allows attributing the variance of the output of a model to the sum of variance of each input of the model and their correlated factors.1 The objective of this development is increasing the accuracy of the resolved PSF model in the complementary technique through the optimization of test pattern sets. Inscale® from Aselta Nanographics is used to prepare the various pattern sets and to check the consequences of development. Fraunhofer IPMS-CNT exposed the prepared data and observed those to visualize the link of sensitivities between the PSF parameters and the test pattern. First, the SA can assess the influence of test pattern sets for the determination of PSF parameters, such as which PSF parameter is affected on the employments of certain pattern. Secondly, throughout the evaluation, the SA enhances the precision of PSF through the optimization of test patterns. Finally, the developed algorithm is able to appraise what ranges of proximity effect correction is crucial on which portion of a real application pattern in the electron beam exposure.

Paper Details

Date Published: 23 October 2015
PDF: 12 pages
Proc. SPIE 9635, Photomask Technology 2015, 963515 (23 October 2015); doi: 10.1117/12.2197175
Show Author Affiliations
Xaver Thrun, Fraunhofer Institute for Photonic Microsystems, CNT (Germany)
Clyde Browning, Aselta Nanographics, MINATEC-BHT (France)
Kang-Hoon Choi, Fraunhofer Institute for Photonic Microsystems, CNT (Germany)
Thiago Figueiro, Aselta Nanographics, MINATEC-BHT (France)
Christoph Hohle, Fraunhofer Institute for Photonic Microsystems, CNT (Germany)
Mohamed Saib, Aselta Nanographics, MINATEC-BHT (France)
Patrick Schiavone, Aselta Nanographics, MINATEC-BHT (France)
Johann W. Bartha, Dresden Univ. of Technology (Germany)

Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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