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Proceedings Paper

Study of various pattern impact for registration and overlay
Author(s): Shingo Yoshikawa; Nobuaki Fujii; Takashi Yamada; Issei Sakai; Katsuya Hayano; Hidemichi Imai; Hiroyuki Miyashita; Takashi Sayano; Sven Heisig; Dirk Beyer
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Proc. SPIE 9635, Photomask Technology 2015, ; doi: 10.1117/12.2197086
Show Author Affiliations
Shingo Yoshikawa, Dai Nippon Printing Co., Ltd. (Japan)
Nobuaki Fujii, Dai Nippon Printing Co., Ltd. (Japan)
Takashi Yamada, Dai Nippon Printing Co., Ltd. (Japan)
Issei Sakai, Dai Nippon Printing Co., Ltd. (Japan)
Katsuya Hayano, Dai Nippon Printing Co., Ltd. (Japan)
Hidemichi Imai, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Takashi Sayano, Carl Zeiss Co., Ltd. (Japan)
Sven Heisig, Carl Zeiss SMS GmbH (Germany)
Dirk Beyer, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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