Share Email Print
cover

Proceedings Paper

A study of reticle CD behavior for inter-area pattern loading difference
Author(s): Sungjin Kim; Kweonjae Lee; Jongsuk Yim; Hyunjoong Kim; Sukwhan Kim; Sukho Shin; Woosun Choi; Jinhee Jung; Kyungwha Chun; Inja Lee; Jooyoung Lee; Hyeongsun Hong; Gyoyoung Jin
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We can control the pattern on wafer without optimization of layout design if we understand reticle cd behavior

Paper Details

Date Published: 23 October 2015
PDF: 7 pages
Proc. SPIE 9635, Photomask Technology 2015, 96351U (23 October 2015); doi: 10.1117/12.2196988
Show Author Affiliations
Sungjin Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Kweonjae Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jongsuk Yim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyunjoong Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sukwhan Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sukho Shin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Woosun Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jinhee Jung, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Kyungwha Chun, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Inja Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jooyoung Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyeongsun Hong, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Gyoyoung Jin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

© SPIE. Terms of Use
Back to Top