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Proceedings Paper

Detection capability enhancement with a learning system for PEM mask inspection tool
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Paper Abstract

A learning system has been exploited for the mask inspection tool with the Projection Electron Microscope (PEM). The defect is identified by the PEM system using the "defectivity". The detection capability for hp11nm EUV masks is demonstrated. The learning system for PEM consists of the library of the registered defects. The learning system totally optimizes detection capability reconciling the previously registered defects and the newly registered defect. We have verified the effectiveness of the learning system. We can provide a user-friendly mask inspection system with the higher throughput by PEM and with the smaller cost of ownership by the development.

Paper Details

Date Published: 23 October 2015
PDF: 9 pages
Proc. SPIE 9635, Photomask Technology 2015, 96350B (23 October 2015); doi: 10.1117/12.2196944
Show Author Affiliations
Ryoichi Hirano, EUVL Infrastructure Development Ctr., Inc. (Japan)
Masahiro Hatakeyama, EBARA Corp. (Japan)
Kenji Terao, EBARA Corp. (Japan)
Hidehiro Watanabe, EUVL Infrastructure Development Ctr., Inc. (Japan)

Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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