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Proceedings Paper

Attenuated phase-shift mask (PSM) blanks for flat panel display
Author(s): Kagehiro Kageyama; Satoru Mochizuki; Hiroyuki Yamakawa; Shigeru Uchida
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Paper Abstract

The fine pattern exposure techniques are required for Flat Panel display applications as smart phone, tablet PC recently. The attenuated phase shift masks (PSM) are being used for ArF and KrF photomask lithography technique for high end pattern Semiconductor applications. We developed CrOx based large size PSM blanks that has good uniformity on optical characteristics for FPD applications. We report the basic optical characteristics and uniformity, stability data of large sized CrOx PSM blanks.

Paper Details

Date Published: 23 October 2015
PDF: 4 pages
Proc. SPIE 9635, Photomask Technology 2015, 96351I (23 October 2015); doi: 10.1117/12.2196857
Show Author Affiliations
Kagehiro Kageyama, ULVAC Coating Corp. (Japan)
Satoru Mochizuki, ULVAC Coating Corp. (Japan)
Hiroyuki Yamakawa, ULVAC Coating Corp. (Japan)
Shigeru Uchida, ULVAC Coating Corp. (Japan)

Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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