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Proceedings Paper

Productivity enhancement and reliability through AutoAnalysis
Author(s): Anthony Garetto; Thomas Rademacher; Kristian Schulz
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Paper Abstract

The decreasing size and increasing complexity of photomask features, driven by the push to ever smaller technology nodes, places more and more challenges on the mask house, particularly in terms of yield management and cost reduction. Particularly challenging for mask shops is the inspection, repair and review cycle which requires more time and skill from operators due to the higher number of masks required per technology node and larger nuisance defect counts. While the measurement throughput of the AIMS™ platform has been improved in order to keep pace with these trends, the analysis of aerial images has seen little advancement and remains largely a manual process. This manual analysis of aerial images is time consuming, dependent on the skill level of the operator and significantly contributes to the overall mask manufacturing process flow.

AutoAnalysis, the first application available for the FAVOR® platform, offers a solution to these problems by providing fully automated analysis of AIMS™ aerial images. Direct communication with the AIMS™ system allows automated data transfer and analysis parallel to the measurements. User defined report templates allow the relevant data to be output in a manner that can be tailored to various internal needs and support the requests of your customers. Productivity is significantly improved due to the fast analysis, operator time is saved and made available for other tasks and reliability is no longer a concern as the most defective region is always and consistently captured. In this paper the concept and approach of AutoAnalysis will be presented as well as an update to the status of the project. The benefits arising from the use of AutoAnalysis will be discussed in more detail and a study will be performed in order to demonstrate.

Paper Details

Date Published: 4 September 2015
PDF: 6 pages
Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610M (4 September 2015); doi: 10.1117/12.2196651
Show Author Affiliations
Anthony Garetto, Carl Zeiss SMS GmbH (Germany)
Thomas Rademacher, Carl Zeiss SMS GmbH (Germany)
Kristian Schulz, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 9661:
31st European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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