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Proceedings Paper

Grab a coffee: your aerial images are already analyzed
Author(s): Anthony Garetto; Thomas Rademacher; Kristian Schulz
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Paper Abstract

For over 2 decades the AIMTM platform has been utilized in mask shops as the standard for actinic review of photomask sites in order to perform defect disposition and repair review. Throughout this time the measurement throughput of the systems has been improved in order to keep pace with the requirements demanded by a manufacturing environment, however the analysis of the sites captured has seen little improvement and remained a manual process. This manual analysis of aerial images is time consuming, subject to error and unreliability and contributes to holding up turn-around time (TAT) and slowing process flow in a manufacturing environment. AutoAnalysis, the first application available for the FAVOR® platform, offers a solution to these problems by providing fully automated data transfer and analysis of AIMTM aerial images. The data is automatically output in a customizable format that can be tailored to your internal needs and the requests of your customers. Savings in terms of operator time arise from the automated analysis which no longer needs to be performed. Reliability is improved as human error is eliminated making sure the most defective region is always and consistently captured. Finally the TAT is shortened and process flow for the back end of the line improved as the analysis is fast and runs in parallel to the measurements. In this paper the concept and approach of AutoAnalysis will be presented as well as an update to the status of the project. A look at the benefits arising from the automation and the customizable approach of the solution will be shown.

Paper Details

Date Published: 9 July 2015
PDF: 9 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580U (9 July 2015); doi: 10.1117/12.2196641
Show Author Affiliations
Anthony Garetto, Carl Zeiss SMS GmbH (Germany)
Thomas Rademacher, Carl Zeiss SMS GmbH (Germany)
Kristian Schulz, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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