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Proceedings Paper

N7 logic via patterning using templated DSA: implementation aspects
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Paper Abstract

In recent years, major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCP). Insertion of DSA for IC fabrication is seriously considered for the 7 nm node. At this node the DSA technology could alleviate costs for multiple patterning and limit the number of masks that would be required per layer. At imec, multiple approaches for inserting DSA into the 7 nm node are considered. One of the most straightforward approaches for implementation would be for via patterning through templated DSA; a grapho-epitaxy flow using cylindrical phase BCP material resulting in contact hole multiplication within a litho-defined pre-pattern. To be implemented for 7 nm node via patterning, not only the appropriate process flow needs to be available, but also DSA-aware mask decomposition is required. In this paper, several aspects of the imec approach for implementing templated DSA will be discussed, including experimental demonstration of density effect mitigation, DSA hole pattern transfer and double DSA patterning, creation of a compact DSA model. Using an actual 7 nm node logic layout, we derive DSA-friendly design rules in a logical way from a lithographer’s view point. A concrete assessment is provided on how DSA-friendly design could potentially reduce the number of Via masks for a place-and-routed N7 logic pattern.

Paper Details

Date Published: 9 July 2015
PDF: 11 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 965804 (9 July 2015); doi: 10.1117/12.2196524
Show Author Affiliations
J. Bekaert, IMEC (Belgium)
J. Doise, IMEC (Belgium)
KU Leuven (Belgium)
R. Gronheid, IMEC (Belgium)
J. Ryckaert, IMEC (Belgium)
G. Vandenberghe, IMEC (Belgium)
G. Fenger, Mentor Graphics (Belgium)
Y. J. Her, AZ Electronic Materials (Korea, Republic of)
Y. Cao, EMD Performance Materials Corp. (United States)

Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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