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Proceedings Paper

The best of both worlds: automated CMP polishing of channel-cut monochromators
Author(s): Elina Kasman; Mark Erdmann; Stanislav Stoupin
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Paper Abstract

The use of a channel-cut monochromator is the most straightforward method to ensure that the two reflection surfaces maintain alignment between crystallographic planes without the need for complicated alignment mechanisms. Three basic characteristics that affect monochromator performance are: subsurface damage which contaminates spectral purity; surface roughness which reduces efficiency due to scattering; and surface figure error which imparts intensity structure and coherence distortion in the beam. Standard chemical-mechanical polishing processes and equipment are used when the diffracting surface is easily accessible, such as for single-bounce monochromators. Due to the inaccessibly of the surfaces inside a channel-cut monochromator for polishing, these optics are generally wet-etched for their final processing. This results in minimal subsurface damage, but very poor roughness and figure error. A new CMP channel polishing instrument design is presented which allows the internal diffracting surface quality of channel-cut crystals to approach that of conventional single-bounce monochromators.

Paper Details

Date Published: 3 September 2015
PDF: 5 pages
Proc. SPIE 9590, Advances in Laboratory-based X-Ray Sources, Optics, and Applications IV, 95900D (3 September 2015); doi: 10.1117/12.2196034
Show Author Affiliations
Elina Kasman, Argonne National Lab. (United States)
Mark Erdmann, Argonne National Lab. (United States)
Stanislav Stoupin, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 9590:
Advances in Laboratory-based X-Ray Sources, Optics, and Applications IV
Ali M. Khounsary; Carolyn A. MacDonald, Editor(s)

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