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Proceedings Paper

Multipulse degradation of fused silica surfaces at 351 nm
Author(s): Sonny Ly; Ted A. Laurence; Nan Shen; Bill Hollingsworth; Mary Norton; Jeff D. Bude
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Paper Abstract

We investigate the multipulse degradation of fused silica surfaces exposed at 351 nm for up to 109 pulses at pulse fluences greater than 10 J/cm2. In vacuum, the transmission loss increases as a function of the number of shots at low pulse intensity. However, as the pulse intensity increases, the transmission loss decreases and is not measureable above a certain intensity. Transmission loss is highest when measured at shorter wavelengths, and decreases towards the IR. Absorption is the primary mechanism that leads to transmission loss and is from photo-reduction of the silica surface.

Paper Details

Date Published: 23 November 2015
PDF: 5 pages
Proc. SPIE 9632, Laser-Induced Damage in Optical Materials: 2015, 96320T (23 November 2015); doi: 10.1117/12.2195595
Show Author Affiliations
Sonny Ly, Lawrence Livermore National Lab. (United States)
Ted A. Laurence, Lawrence Livermore National Lab. (United States)
Nan Shen, Lawrence Livermore National Lab. (United States)
Bill Hollingsworth, Lawrence Livermore National Lab. (United States)
Mary Norton, Lawrence Livermore National Lab. (United States)
Jeff D. Bude, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 9632:
Laser-Induced Damage in Optical Materials: 2015
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

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