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Proceedings Paper

Fast alternative method for measuring the wavefront of lithography exposure systems
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Paper Abstract

The work presented here describes the analysis of problems of the realization of alternative wavefront measurement methods for lithography exposure machines. The measurement method that is introduced is a redesign of a conventional Shack-Hartmann wavefront sensor and was based on the usage of a single pinhole and the lithography machine itself. Such a redesign is useful because it increases the degrees of freedom. Therefore, there is more freedom to analyze the problems of designing and planning measurements. A group of hardware prototypes under laboratory conditions with the required angular and lateral resolution were realized. For the approximation of the measurement results, numerical simulations are implemented using the Monte-Carlo method in order to statistically design the experiments themselves.

Paper Details

Date Published: 4 September 2015
PDF: 7 pages
Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610J (4 September 2015); doi: 10.1117/12.2195334
Show Author Affiliations
Alexander Kabardiadi, Westsächsische Hochschule Zwickau (Germany)
Heiko Assmann, Infineon Dresden GmbH (Germany)
Andreas Greiner, Infineon Technologies Dresden (Germany)
Tobias Baselt, Westsächsische Hochschule Zwickau (Germany)
Christopher Taudt, Westsächsische Hochschule Zwickau (Germany)
Peter Hartmann, Westsächsische Hochschule Zwickau (Germany)


Published in SPIE Proceedings Vol. 9661:
31st European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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