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Proceedings Paper

Extreme ultraviolet light sources and soft x-ray laser based on discharge produced plasma
Author(s): Eiki Hotta; Yusuke Sakai; Yasushi Hayashi; Gohta Niimi; Bin Huang; Qiushi Zhu; Inho Song; Masato Watanabe
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Paper Abstract

Due to the demand to realize shorter wavelength light sources, extreme ultraviolet (EUV) sources and soft x-ray laser (SXRL) are under development. The development of EUV sources at the wavelength of 13.5 nm started to realize light sources to be used for next generation lithography. Xenon was used at the beginning of development, however, to attain higher conversion efficiency, tin is now used as fuel. As a coherent light source, capillary discharge SXRL is under development. After the demonstration of Ne-like Ar SXRL by using electron collisional excitation scheme, the effort to shorten the wavelength has been made by adopting recombination scheme such as H-like N. Though the challenge has not yet been successful, the source has potential to be used as a SXR source in the water window wavelength region. Current status of EUV and SXR sources based on discharge produced plasma will be given.

Paper Details

Date Published: 17 July 2015
PDF: 8 pages
Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95242U (17 July 2015); doi: 10.1117/12.2195258
Show Author Affiliations
Eiki Hotta, Tokyo Institute of Technology (Japan)
Yusuke Sakai, Tokyo Institute of Technology (Japan)
Yasushi Hayashi, Tokyo Institute of Technology (Japan)
Gohta Niimi, Tokyo Institute of Technology (Japan)
Bin Huang, Tokyo Institute of Technology (Japan)
Qiushi Zhu, Tokyo Institute of Technology (Japan)
Inho Song, Tokyo Institute of Technology (Japan)
Masato Watanabe, Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 9524:
International Conference on Optical and Photonic Engineering (icOPEN 2015)
Anand K. Asundi; Yu Fu, Editor(s)

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