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Proceedings Paper

Optimization of rule-based OPC fragmentation to improve wafer image rippling
Author(s): Jingyu Wang; Alexander Wei; Piyush Verma; William Wilkinson
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Paper Abstract

To provide insights into best practices of constructing an OPC recipe that suppresses wafer image rippling, we design versatile fragmentation rules with respect to the model-based resist image. Specifically, by recognizing that rippling effect exists before fragmentation, we conduct a coarse simulation with default engine settings and extract raw ripple sinusoidal components associated with signature geometries along all dimensions. The signal is predominantly optical, hence a good representation of the unfiltered diffraction. By referencing the rippling periodic features, we derive a global solution for fragmentation with full respect to geometrical boundary conditions. The methodology enables us to generate a robust fragmentation solution with minimum trial and error and improve target convergence especially along unfavorable dimensions.

Paper Details

Date Published: 4 September 2015
PDF: 16 pages
Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610D (4 September 2015); doi: 10.1117/12.2194755
Show Author Affiliations
Jingyu Wang, GLOBALFOUNDRIES Inc. (Germany)
Alexander Wei, Mentor Graphics Corp. (United States)
Piyush Verma, GLOBALFOUNDRIES Inc. (United States)
William Wilkinson, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 9661:
31st European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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