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Proceedings Paper

Reverse replication of circular micro grating structures with soft lithography
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Paper Abstract

In this work, the reverse replication of circular micro grating structures on glass substrates is implemented using an ultra-violet curable resin and a polydimethylsiloxane (PDMS) mold which has the same structure as the original circular grating master. Two different techniques (“double PDMS replication” and “polymer- PDMS replication”) are employed to fabricate those reversed circular micro grating structures. Surface profiling measurements show that in case of the polymer-PDMS replication the dimensions of the resulting circular grating structures closely approximate those of the master, while the grating height is slightly decreased in case of the double PDMS replication technique, mainly due to the use of the releasing agent. For both methods, the grating slopes of the circular gratings are almost unchanged, leading to the desired optical performance. The two techniques are quite useful for more accurate reverse replications of micro optical and photonic structures.

Paper Details

Date Published: 4 September 2015
PDF: 7 pages
Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610V (4 September 2015); doi: 10.1117/12.2194351
Show Author Affiliations
Xiaobing Shang, Univ. Gent (Belgium)
Jeroen Missinne, Univ. Gent (Belgium)
Nuria Teigell Beneitez, Univ. Gent (Belgium)
Michal Jablonski, Univ. Gent (Belgium)
Jelle De Smet, Univ. Gent (Belgium)
Pankaj Joshi, Univ. Gent (Belgium)
Dieter Cuypers, Univ. Gent (Belgium)
Tigran Baghdasaryan, Vrije Univ. Brussel (Belgium)
Michael Vervaeke, Vrije Univ. Brussel (Belgium)
Hugo Thienpont, Vrije Univ. Brussel (Belgium)
Herbert De Smet, Univ. Gent (Belgium)


Published in SPIE Proceedings Vol. 9661:
31st European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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