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Proceedings Paper

Development of EUV scatterometer with high-harmonic-generation EUV source for nano-scale grating measurement
Author(s): Chia-Liang Yeh; Yi-Sha Ku; Yi-Chen Hsieh; Chia-Hung Cho
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Paper Abstract

We have developed a EUV scatterometer using a focused high-order harmonic generation (HHG) source for nano-scale grating measurement. The coherent light source with multiple discrete wavelengths of 25-35 nm was pumped by a tabletop Ti:sapphire laser system. A charge-couple-device (CCD) camera directly records the diffraction image of the zero and the first order diffraction information from the grating samples. The grating structure can be reconstructed base on the calculations from the location and the intensity distribution of diffraction pattern.

Paper Details

Date Published: 20 August 2015
PDF: 8 pages
Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95561F (20 August 2015); doi: 10.1117/12.2194234
Show Author Affiliations
Chia-Liang Yeh, Industrial Technology Research Institute (Taiwan)
Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)
Yi-Chen Hsieh, Industrial Technology Research Institute (Taiwan)
Chia-Hung Cho, Industrial Technology Research Institute (Taiwan)


Published in SPIE Proceedings Vol. 9556:
Nanoengineering: Fabrication, Properties, Optics, and Devices XII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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