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Proceedings Paper

Optical monitoring of high throughput ion beam sputtering deposition
Author(s): Ove Lyngnes; Ulf Brauneck; Jinsong Wang; Ralf Erz; Sandeep Kohli; Binyamin Rubin; James Kraus; David Deakins
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Paper Abstract

Ion Beam Sputtering (IBS) offers a deposition process yielding optical thin films with stable optical parameters, near bulk density, and ppm level optical loss. Recently higher throughput systems with higher deposition rate and larger substrate fixtures have been developed. The higher deposition rates make accurate layer control essential. This is most readily achieved by using an optical monitoring system (OMS).

Multiple optical bandpass, edge filters and notch filters have been deposited in a high throughput IBS system with four 333mm diameter planetary using both a single wavelength (SWLOMS) as well as a broadband OMS (BBOMS). A wavelength repeatability of less than 0.1% for five subsequent short wave pass filters is demonstrated. Results for a multi notch filter coated using the BBOMS are also presented. A control strategy utilizing a mix of a broadband and a single wavelength model was used successfully in the deposition.

Spectral performance of multiple bandpass filters using turning point control is presented. A 2D mapping of a 15nm FWHM bandpass filter centered at 830nm shows a +/-0.05% variation in the center wavelength across the central 180mm diameter and a +/-0.35nm variation in the FWHM to the edge of the wafer. A variation of the standard turning point monitoring that enables control of filters with narrower bandwidth than the spectral resolution of the OMS system has been developed. A 0.8nm FWHM bandpass filter centered at 532nm controlled using a BBOMS with a ~1.5nm FWHM spectral resolution of the spectrometer is demonstrated.

Paper Details

Date Published: 23 September 2015
PDF: 8 pages
Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962715 (23 September 2015); doi: 10.1117/12.2194090
Show Author Affiliations
Ove Lyngnes, Veeco Instruments, Inc. (United States)
Ulf Brauneck, SCHOTT Suisse SA (Switzerland)
Jinsong Wang, Vecco Instruments, Inc. (United States)
Ralf Erz, Veeco Instruments, Inc. (United States)
Sandeep Kohli, Veeco Instruments, Inc. (United States)
Binyamin Rubin, Veeco Instruments, Inc. (United States)
James Kraus, Veeco Instruments, Inc. (United States)
David Deakins, Veeco Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 9627:
Optical Systems Design 2015: Advances in Optical Thin Films V
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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