Share Email Print
cover

Proceedings Paper

The fabrication of the holographic echelle gratings
Author(s): Quan Liu; Fei Gao; Yang Zhou; Jianhong Wu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The echelle gratings with the ultra-high resolution are one of the key elements in spectroscopy, optical communications and other fields. Currently, the diamond ruling and the wet etching technique are two primary methods to fabricate echelle gratings. In this paper, we have adopted a new method of the echelle gratings fabrication. Firstly, the holographic lithography is used to form a photoresist grating mask. Then, reactive ion etching is adopted to fabricate the native substrate grating mask to replace the traditional photoresist grating mask, which allows more accurate control of the profile. Finally, the tilted ion-beam etching is used to etch the native substrate grating to ensure the precise control of the blazed angle and anti-blazed angle. A prototype of the echelle gratings with a line density of 80 lp/mm has been fabricated by above method.

Paper Details

Date Published: 12 August 2015
PDF: 6 pages
Proc. SPIE 9624, 2015 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication, 96240F (12 August 2015); doi: 10.1117/12.2193399
Show Author Affiliations
Quan Liu, Soochow Univ. (China)
Fei Gao, Soochow Univ. (China)
Yang Zhou, Soochow Univ. (China)
Jianhong Wu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 9624:
2015 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication
Zhiping Zhou; Changhe Zhou; Pavel Cheben, Editor(s)

© SPIE. Terms of Use
Back to Top