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Proceedings Paper

Strategy optimization for mask rule check in wafer fab
Author(s): Chuen Huei Yang; Shaina Lin; Roger Lin; Alice Wang; Rachel Lee; Erwin Deng
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Paper Abstract

Photolithography process is getting more and more sophisticated for wafer production following Moore’s law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers’ judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

Paper Details

Date Published: 9 July 2015
PDF: 5 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580Y (9 July 2015); doi: 10.1117/12.2192951
Show Author Affiliations
Chuen Huei Yang, United Microelectronics Corp. (Taiwan)
Shaina Lin, United Microelectronics Corp. (Taiwan)
Roger Lin, United Microelectronics Corp. (Taiwan)
Alice Wang, United Microelectronics Corp. (Taiwan)
Rachel Lee, United Microelectronics Corp. (Taiwan)
Erwin Deng, United Microelectronics Corp. (Taiwan)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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