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Proceedings Paper

Apparatus and method of optical marker projection for the three-dimensional shape measurement
Author(s): Zhe Chen; Xinghua Qu; Xin Geng; Fumin Zhang
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Paper Abstract

Optical photography measurement and three-dimensional (3-D) scanning measurement have been widely used in the field of the fast dimensional and surface metrology. In the measurement process, however, retro-reflective markers are often pasted on the surface in advance for image registration and positioning the 3-D measuring instruments. For the large-scale workpiece with freeform surface, the process of pasting markers is time consuming, which reduces the measurement efficiency. Meanwhile, the measurement precision is impaired owing to the thickness of the marker. In this paper, we propose a system that projects two-dimensional (2-D) array optical markers with uniform energy on the surface of the workpiece instead of pasting retro-reflective markers, which achieves large-range and automated optical projection of the mark points. In order to conjunction with the 3-D handheld scanner belonging to our team, we develop an apparatus of optical marker projection, which is mainly composed of the high-power laser, the optical beam expander system, adjustable aperture stop and Dammann grating of dibasic spectrophotometric device. The projection apparatus can achieve the function of beams of 15 * 15 uniformly light of the two-dimensional lattice. And it’s much cheaper than the existing systems.

Paper Details

Date Published: 7 August 2015
PDF: 9 pages
Proc. SPIE 9623, 2015 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 96230Z (7 August 2015); doi: 10.1117/12.2192678
Show Author Affiliations
Zhe Chen, Tianjin Univ. (China)
Xinghua Qu, Tianjin Univ. (China)
Xin Geng, Tianjin Univ. (China)
Fumin Zhang, Tianjin Univ. (China)


Published in SPIE Proceedings Vol. 9623:
2015 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Jigui Zhu; Hwa-Yaw Tam; Kexin Xu; Hai Xiao; Sen Han, Editor(s)

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