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Proceedings Paper

Phase extraction based on sinusoidal extreme strip phase shifting method
Author(s): Mei Hui; Ming Liu; Liquan Dong; Xiaohua Liu; Yuejin Zhao
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Paper Abstract

Multiple synthetic aperture imaging can enlarge pupil diameter of optical systems, and increase system resolution. Multiple synthetic aperture imaging is a cutting-edge topic and research focus in recent years, which is prospectively widely applied in fields like astronomical observations and aerospace remote sensing. In order to achieve good imaging quality, synthetic aperture imaging system requires phase extraction of each sub-aperture and co-phasing of whole aperture. In the project, an in-depth study about basic principles and methods of segments phase extraction was done. The study includes: application of sinusoidal extreme strip light irradiation phase shift method to extract the central dividing line to get segment phase extraction information, and the use of interference measurement to get the aperture phase extraction calibration coefficients of spherical surface. Study about influence of sinusoidal extreme strip phase shift on phase extraction, and based on sinusoidal stripe phase shift from multiple linear light sources of the illumination reflected image, to carry out the phase shift error for inhibiting the effect in the phase extracted frame.

Paper Details

Date Published: 7 August 2015
PDF: 6 pages
Proc. SPIE 9623, 2015 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 962309 (7 August 2015); doi: 10.1117/12.2192640
Show Author Affiliations
Mei Hui, Beijing Institute of Technology (China)
Ming Liu, Beijing Institute of Technology (China)
Liquan Dong, Beijing Institute of Technology (China)
Xiaohua Liu, Beijing Institute of Technology (China)
Yuejin Zhao, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 9623:
2015 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Jigui Zhu; Hwa-Yaw Tam; Kexin Xu; Hai Xiao; Sen Han, Editor(s)

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