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Proceedings Paper

Evaluation of a dot target based high-brightness microplasma extreme ultraviolet (EUV) source by hydrodynamic simulation
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Paper Abstract

We evaluate the EUV emission and the spatial distributions of the plasma parameters by use of the two-dimensional (2-D) radiation hydrodynamic simulation in the microplasma high-brightness EUV source. The expected EUV source size, which is attributed to the expanding microplasma by the hydrodynamic motion, was evaluated to be 15 μm at the laser pulse duration of 150 ps [full width at half-maximum (FWHM)]. The numerical simulation suggests that the high brightness EUV source should be produced by use of a dot target based microplasma with the source diameter less than 20 μm. The emission at 13.5 nm was attributed to Sn charge states between Sn7+ and Sn12+ with the UTA spectral structure.

Paper Details

Date Published: 9 July 2015
PDF: 6 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96581B (9 July 2015); doi: 10.1117/12.2192194
Show Author Affiliations
Hiroyuki Hara, Utsunomiya Univ. (Japan)
Goki Arai, Utsunomiya Univ. (Japan)
Thanh-Hung Dinh, Utsunomiya Univ. (Japan)
Atsushi Sunahara, Osaka Univ. (Japan)
Takeshi Higashiguchi, Utsunomiya Univ. (Japan)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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