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Proceedings Paper

Experimental observation of laser-produced Sn extreme ultraviolet source diameter for high-brightness source
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Paper Abstract

The effect of sub-ns duration and sub-mJ energy laser pulse on 13.5 nm extreme ultraviolet (EUV) source diameter and conversion efficiency has been investigated. It was demonstrated that an in-band EUV source diameter as low as 18 μm has been produced due to short scale length of the picoseconds duration laser plasma. Such EUV source is suitable for high brightness and high repetition rate metrology applications.

Paper Details

Date Published: 9 July 2015
PDF: 6 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96581A (9 July 2015); doi: 10.1117/12.2192188
Show Author Affiliations
Goki Arai, Utsunomiya Univ. (Japan)
Hiroyuki Hara, Utsunomiya Univ. (Japan)
Thanh-Hung Dinh, Utsunomiya Univ. (Japan)
Atsushi Sunahara, Osaka Univ. (Japan)
Takeshi Higashiguchi, Utsunomiya Univ. (Japan)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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