Share Email Print
cover

Proceedings Paper

Simulation in thin film technology
Author(s): Marcus Turowski; Marco Jupé; Henrik Ehlers; Thomas Melzig; Andreas Pflug; Detlev Ristau
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Simulation and modeling find more and more their way into thin film technology. Beside theoretical models for layer design, pre-production design analysis, and real time process control, atomistic simulation techniques gain of importance. Here, especially classical procedures such as Direct Simulation and Particle-in-Cell Monte Carlo (DSMC/PIC-MC), kinetic Monte Carlo (kMC) and Molecular Dynamics (MD) as well as quantum mechanical techniques based on Density Functional Theory (DFT) have to be mentioned. These methods are applied in order to investigate the material transport inside the coating facilities, the thin film growth in dependence of characteristic process conditions, and the optical and electronic thin film properties. By combination of these atomistic techniques in a suitable manner, a multiple scale simulation model can be realized for investigating the influence of specific process conditions on the resulting layer properties. The further extension of this “virtual coater” concept with respect to rate equation models enables the possibility to investigate also the interaction of laser irradiation with the modeled thin film structures.

Paper Details

Date Published: 23 September 2015
PDF: 10 pages
Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962707 (23 September 2015); doi: 10.1117/12.2191693
Show Author Affiliations
Marcus Turowski, Laser Zentrum Hannover e.V. (Germany)
Marco Jupé, Laser Zentrum Hannover e.V. (Germany)
Leibniz Univ. Hannover (Germany)
Henrik Ehlers, Laser Zentrum Hannover e.V. (Germany)
Thomas Melzig, Fraunhofer Institute for Surface Engineering and Thin Films IST (Germany)
Andreas Pflug, Fraunhofer Institute for Surface Engineering and Thin Films IST (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)
Leibniz Univ. Hannover (Germany)


Published in SPIE Proceedings Vol. 9627:
Optical Systems Design 2015: Advances in Optical Thin Films V
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

© SPIE. Terms of Use
Back to Top