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Proceedings Paper

Lens-mount stability trade-off: a survey exemplified for DUV wafer inspection objectives
Author(s): Achmed Bouazzam; Torsten Erbe; Stephan Fahr; Jan Werschnik
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Paper Abstract

The position stability of optical elements is an essential part of the tolerance budget of an optical system because its compensation would require an alignment step after the lens has left the factory. In order to achieve a given built performance the stability error contribution needs to be known and accounted for. Given a high-end lens touching the edge of technology not knowing, under- or overestimating this contribution becomes a serious cost and risk factor. If overestimated the remaining parts of the budget need to be tighter. If underestimated the total project might fail. For many mounting principles the stability benchmark is based on previous systems or information gathered by elaborated testing of complete optical systems. This renders the development of a new system into a risky endeavour, because these experiences are not sufficiently precise and tend to be not transferable when scaling of the optical elements is intended. This contribution discusses the influences of different optical mounting concepts on the position stability using the example of high numerical aperture (HNA) inspection lenses working in the deep ultraviolet (DUV) spectrum. A method to investigate the positional stability is presented for selected mounting examples typical for inspection lenses.

Paper Details

Date Published: 23 September 2015
PDF: 8 pages
Proc. SPIE 9626, Optical Systems Design 2015: Optical Design and Engineering VI, 96261E (23 September 2015); doi: 10.1117/12.2191511
Show Author Affiliations
Achmed Bouazzam, JENOPTIK Optical Systems GmbH (Germany)
Torsten Erbe, JENOPTIK Optical Systems GmbH (Germany)
Stephan Fahr, JENOPTIK Optical Systems GmbH (Germany)
Jan Werschnik, JENOPTIK Optical Systems GmbH (Germany)

Published in SPIE Proceedings Vol. 9626:
Optical Systems Design 2015: Optical Design and Engineering VI
Laurent Mazuray; Rolf Wartmann; Andrew P. Wood, Editor(s)

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