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Proceedings Paper

In-line metrology setup for periodic nanostructures based on sub-wavelength diffraction
Author(s): Martin Kreuzer; Jordi Gomis Bresco; Marianna Sledzinska; Clivia M. Sotomayor Torres
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Paper Abstract

The analysis of diffracted light from periodic structures is shown to be a versatile metrology technique applicable to inline metrology for periodic nanostructures. We show that 10 nm changes in periodic structures can be traced optically by means of sub-wavelength diffraction. Polymer gratings were fabricated by electron beam lithography. The gratings have a common periodicity of 6 μm, but different line width, ranging from 370 to 550 nm in 10 nm steps. A comparison between the resulting diffraction patterns shows marked differences in intensity which are used to sense nanometre scale deviations in periodic structures.

Paper Details

Date Published: 24 September 2015
PDF: 7 pages
Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 96281Q (24 September 2015); doi: 10.1117/12.2191346
Show Author Affiliations
Martin Kreuzer, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Jordi Gomis Bresco, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Marianna Sledzinska, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Clivia M. Sotomayor Torres, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Catalan Institute of Research and Advanced Studies (ICREA) (Spain)


Published in SPIE Proceedings Vol. 9628:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
Angela Duparré; Roland Geyl, Editor(s)

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