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Proceedings Paper

Structual and optical performance of Pd/B4C working from 7.5nm to 12nm
Author(s): Yiwen Wang; Qiushi Huang; Qiang Yi; Jinshuai Zhang; Mingwu Wen; Jiang Li; Dechao Xu; Zhong Zhang; Zhanshan Wang
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Paper Abstract

Boron or boron carbide based multilayers are widely used due to the boron-K absorption edge format λ=6.7nm. Pd/B4C has a relatively high theoretical reflectivity from 7.5nm to 11nm, compared to other candidates like Mo/B4C and La/B4C. It can also be easily fabricated by direct current magnetron sputtering technique. In this paper, different process parameters, including base pressure and sputtering pressure, are optimized to develop the Pd/B4C multilayer mirror. A reflectance of 36.2% were obtained at 9.41nm with 80 bilayers Pd/B4C. Reactive sputtering with nitrogen was also explored to improve the structure and reduce the stress of the Pd/B4C multilayers. The results showed that the EUV reflectance was not improved after the introduction of nitrogen while the stress was actually reduced.

Paper Details

Date Published: 23 September 2015
PDF: 7 pages
Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96271Q (23 September 2015); doi: 10.1117/12.2191296
Show Author Affiliations
Yiwen Wang, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Qiang Yi, Institute of Nuclear Physics and Chemistry (China)
Jinshuai Zhang, Tongji Univ. (China)
Mingwu Wen, Tongji Univ (China)
Jiang Li, Tongji Univ. (China)
Dechao Xu, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 9627:
Optical Systems Design 2015: Advances in Optical Thin Films V
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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