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Proceedings Paper

Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
Author(s): Kristin Pfeiffer; Svetlana Shestaeva; Astrid Bingel; Peter Munzert; Ulrike Schulz; Norbert Kaiser; Andreas Tünnermann; Adriana Szeghalmi
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Paper Abstract

This study focuses on the atomic layer deposition (ALD) of high quality SiO2 thin films for optical application. One of the challenges for the application of dielectric ALD layers in optical coatings is the realization of low absorption and scattering losses. Furthermore the layers have to be prepared with a precise controlled thickness and repeatable optical properties. SiO2 films were deposited using tris[dimethylamino]silane (3DMAS) and oxygen plasma on Si(100)substrates, quartz and BK7 glass substrates at temperatures between 100 °C and 300 °C. Film growth rate and refractive indices of SiO2 thin films were studied as function of deposition temperature. A linear growth behavior of SiO2 ALD films is confirmed, allowing a scalability of film thickness just by counting ALD cycles. The grown films are resistant to abrasion and possess good adhesion to glass substrates. The optical losses of the films are negligible in the investigated spectral range from 250 nm to 1100 nm. An antireflective (AR) coating was prepared by atomic layer deposition using SiO2 as low refractive index material and HfO2 as high refractive index material.

Paper Details

Date Published: 23 September 2015
PDF: 7 pages
Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270Q (23 September 2015); doi: 10.1117/12.2191283
Show Author Affiliations
Kristin Pfeiffer, Friedrich-Schiller-Univ. Jena (Germany)
Svetlana Shestaeva, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Astrid Bingel, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Peter Munzert, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Ulrike Schulz, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Norbert Kaiser, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Andreas Tünnermann, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Adriana Szeghalmi, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 9627:
Optical Systems Design 2015: Advances in Optical Thin Films V
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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