Share Email Print

Proceedings Paper

Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

It is possible to encounter thin films exhibiting various defects in practice. One of these defects is area non-uniformity in optical parameters (e.g. in thickness). Therefore it is necessary to have methods for an optical characterization of nonuniform thin films. Imaging spectroscopic reflectometry provides methods enabling us to perform an efficient optical characterization of such films. It gives a possibility to determine spectral dependencies of a local reflectance at normal incidence of light belonging to small areas (37 μm × 37 μm in our case) on these non-uniform films. The local reflectance is measured by individual pixels of a CCD camera serving as a detector of an imaging spectroscopic reflectometer. It is mostly possible to express the local reflectance using formulas corresponding to a uniform thin film. It allows a relatively simple treatment of the experimental data obtained by imaging spectroscopic reflectometry. There are three methods for treating these experimental data in the special case of thickness non-uniformity, i.e. in the case of the same optical constants within a certain area of the film - single pixel imaging spectroscopic reflectometry method, combination of single-pixel imaging spectroscopic reflectometry method and conventional methods (conventional single spot spectroscopic ellipsometry and spectrophotometry), and multi-pixel imaging spectroscopic reflectometry method. These methods are discussed and examples of the optical characterization of thin films non-uniform in thickness corresponding to these methods are presented in this contribution.

Paper Details

Date Published: 24 September 2015
PDF: 13 pages
Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 96280R (24 September 2015); doi: 10.1117/12.2191052
Show Author Affiliations
Miloslav Ohlídal, Brno Univ. of Technology (Czech Republic)
Ivan Ohlidal, Masaryk Univ. (Czech Republic)
David Nečas, Masaryk Univ. (Czech Republic)
Jiří Vodák, Brno Univ. of Technology (Czech Republic)
Daniel Franta, Masaryk Univ. (Czech Republic)
Pavel Nádaský, Brno Univ. of Technology (Czech Republic)
František Vižd'a, Univ. of Defence (Czech Republic)

Published in SPIE Proceedings Vol. 9628:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
Angela Duparré; Roland Geyl, Editor(s)

© SPIE. Terms of Use
Back to Top