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Proceedings Paper

Low scattering filter coatings made by plasma-assisted reactive magnetron sputtering
Author(s): Jan Broßmann; Marc Lappschies; Stefan Jakobs; Volker Kirschner
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Paper Abstract

Scattering in thin-film filters is mainly driven by the substrate roughness and the deposition technology but also by the coating design as well as by the filter orientation. A high-energy, low-loss coating technology (plasma-assisted reactive magnetron sputtering, PARMS) was used to deposit an advanced thin-film filter design on substrates with low micro roughness. This approach resulted in a significantly reduced level of scattered light as well as an excellent spectral performance of the produced filters. Compared to coatings deposited by ion-assisted evaporation (IAD), the level of out-of-band scattering could be reduced by more than 2 orders of magnitude to about 0.001%.

Paper Details

Date Published: 23 September 2015
PDF: 9 pages
Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962710 (23 September 2015); doi: 10.1117/12.2191046
Show Author Affiliations
Jan Broßmann, Optics Balzers Jena GmbH (Germany)
Marc Lappschies, Optics Balzers Jena GmbH (Germany)
Stefan Jakobs, Optics Balzers Jena GmbH (Germany)
Volker Kirschner, European Space Research and Technology Ctr. (Netherlands)

Published in SPIE Proceedings Vol. 9627:
Optical Systems Design 2015: Advances in Optical Thin Films V
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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