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Proceedings Paper

Quantitative nanomechanical measurement of electron beam surface modification
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Paper Abstract

Electron beam induced surface damage in general, and resist shrinkage in particular, are serious issues in any form of electron beam based metrology. Previous studies investigated dimensional changes that occur in resists that were exposed to electron beams. This work builds on these previous studies to consider changes to the material properties of the exposed resists and other materials using quantitative nano-mechanical mapping scanning probe microscopy. Initial data has shown clearly that there are measurable material differences between pre- and post-electron beam exposure. To study this change iArF photo-resists are exposed to varying electron beam energies and doses. These regions are then measured via SPM for dimensional and material property changes. These changes in the exposed areas are correlated to those predicted by modeled results.

Paper Details

Date Published: 10 April 2015
PDF: 7 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242R (10 April 2015); doi: 10.1117/12.2190984
Show Author Affiliations
Aaron Cordes, SEMATECH Inc. (United States)
Benjamin Bunday, SEMATECH Inc. (United States)
Cecilia Montgomery, SEMATECH Inc. (United States)
Jason Osborne, Bruker-Nano Inc. (United States)
Sean Hand, Bruker-Nano Inc. (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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