Share Email Print
cover

Proceedings Paper

Multilayer coatings for free electron laser sources
Author(s): Alain Jody Corso; Paola Zuppella; Davide Bacco; Enrico Tessarolo; Marco Nardello; Francesca Gerlin; Emiliano Principi; Erika Giangrisostomi; Filippo Bencivenga; Alessandro Gessini; C. Masciovecchio; A. Giglia; S. Nannarone; Maria Guglielmina Pelizzo
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Extreme Ultraviolet (EUV) multilayer (ML) technology has been intensively applied in many scientific and technological fields such as solar physics and photolithography. More recently, the advent of free electron lasers (FEL) emitting bright sub-ps pulses with very high quality in term of intensity stability, coherence and temporal shape has encouraged the usage of multilayer coatings also in the transport and manipulation of FEL radiation. In fact, conventional single layers coated mirrors provide negligible reflectance in the EUV spectral range whereas ML mirrors can reach high efficiency at normal incidence without affecting the pulses characteristics. Such optical elements have been also exploited at FERMI@ELETTRA FEL where novel multilayer coatings specifically conceived for pump and probe experiment and ultrafast absorption spectroscopy have been designed. The main results are reported.

Paper Details

Date Published: 26 August 2015
PDF: 7 pages
Proc. SPIE 9588, Advances in X-Ray/EUV Optics and Components X, 958802 (26 August 2015); doi: 10.1117/12.2190888
Show Author Affiliations
Alain Jody Corso, Univ. degli Studi di Padova (Italy)
Paola Zuppella, Univ. degli Studi di Padova (Italy)
Davide Bacco, Univ. degli Studi di Padova (Italy)
Enrico Tessarolo, Univ. degli Studi di Padova (Italy)
Marco Nardello, Univ. degli Studi di Padova (Italy)
Francesca Gerlin, Univ. degli Studi di Padova (Italy)
Emiliano Principi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Erika Giangrisostomi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Univ. degli Studi di Trieste (Italy)
Filippo Bencivenga, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Alessandro Gessini, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
C. Masciovecchio, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
A. Giglia, First Officina Material IOM Lab., CNR (Italy)
S. Nannarone, First Officina Material IOM Lab., CNR (Italy)
Maria Guglielmina Pelizzo, Univ. degli Studi di Padova (Italy)


Published in SPIE Proceedings Vol. 9588:
Advances in X-Ray/EUV Optics and Components X
Shunji Goto; Christian Morawe; Ali M. Khounsary, Editor(s)

© SPIE. Terms of Use
Back to Top