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Proceedings Paper

Angle resolved backscatter of HfO2/SiO2 multilayer mirror at 1064 nm
Author(s): Jue Wang; Sven Schröder; Marcus Trost; Matthias Hauptvogel; Angela Duparré
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Paper Abstract

Angle resolved light scattering was measured at 1064 nm on an HfO2/SiO2 multilayer mirror deposited via modified plasma ion-assisted deposition. A total backscatter of approximately 4.0×10-4 was calculated by integrating the angle resolved scattering curves over the backscattering hemisphere. In this way, also the an integrated near angle backscatter of 1.2×10-4 was derived for angles from 0° to 2° and an integrated near angle scatter of 6×10-5 was determined in the most critical range from 0.5° to 2°. 12% of the total backscatter originated from the near angle region between 2° and 4°. 36%, 62%, 76% and 86% of the total backscatter were created from 2° to 10°, 20°, 30° and 40°, respectively. Good agreement was obtained for the total backscatter values calculated from the ARS measurements and the top-surface roughness derived by AFM measurements.

Paper Details

Date Published: 22 May 2015
PDF: 9 pages
Proc. SPIE 9453, Window and Dome Technologies and Materials XIV, 94530T (22 May 2015); doi: 10.1117/12.2190663
Show Author Affiliations
Jue Wang, Corning Specialty Materials, Inc. (United States)
Sven Schröder, Fraunhofer Institute for Applied Optics and Precision Engineering IOF (Germany)
Marcus Trost, Fraunhofer Institute for Applied Optics and Precision Engineering IOF (Germany)
Matthias Hauptvogel, Fraunhofer Institute for Applied Optics and Precision Engineering IOF (Germany)
Angela Duparré, Fraunhofer Institute for Applied Optics and Precision Engineering IOF (Germany)


Published in SPIE Proceedings Vol. 9453:
Window and Dome Technologies and Materials XIV
Brian J. Zelinski; Randal W. Tustison, Editor(s)

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