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Proceedings Paper

Phase shift reflectometry for wafer inspection
Author(s): Kuang Peng; Yiping Cao; Hongru Li; Jianfei Sun; Thomas Bourgade; Anand Krishna Asundi
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Paper Abstract

In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The profile result of the whole wafer can be reconstructed and it is a curve. As the height of the structures on the wafer is the target we are interested in, by fitting and subtracting the curve surface, the structures on the wafer can be observed on the flat surface. To confirm the quality farther, a part of the wafer is captured and zoomed in to be detected so that the difference between two structures can be observed better.

Paper Details

Date Published: 17 July 2015
PDF: 6 pages
Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95242T (17 July 2015); doi: 10.1117/12.2190644
Show Author Affiliations
Kuang Peng, Sichuan Univ. (China)
Nanyang Technological Univ. (Singapore)
Yiping Cao, Sichuan Univ. (China)
Hongru Li, Nanyang Technological Univ. (Singapore)
Sichuan Univ. (China)
Jianfei Sun, Nanyang Technological Univ. (Singapore)
Hefei Univ. of Technology (China)
Thomas Bourgade, Nanyang Technological Univ. (Singapore)
Anand Krishna Asundi, Nanyang Technological Univ. (Singapore)

Published in SPIE Proceedings Vol. 9524:
International Conference on Optical and Photonic Engineering (icOPEN 2015)
Anand K. Asundi; Yu Fu, Editor(s)

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