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Proceedings Paper

Reduced basis method for Maxwell's equations with resonance phenomena
Author(s): Martin Hammerschmidt; Sven Herrmann; Jan Pomplun; Lin Zschiedrich; Sven Burger; Frank Schmidt
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Paper Abstract

Rigorous optical simulations of 3-dimensional nano-photonic structures are an important tool in the analysis and optimization of scattering properties of nano-photonic devices or parameter reconstruction. To construct geometrically accurate models of complex structured nano-photonic devices the finite element method (FEM) is ideally suited due to its flexibility in the geometrical modeling and superior convergence properties. Reduced order models such as the reduced basis method (RBM) allow to construct self-adaptive, error-controlled, very low dimensional approximations for input-output relationships which can be evaluated orders of magnitude faster than the full model. This is advantageous in applications requiring the solution of Maxwell's equations for multiple parameters or a single parameter but in real time. We present a reduced basis method for 3D Maxwell's equations based on the finite element method which allows variations of geometric as well as material and frequency parameters. We demonstrate accuracy and efficiency of the method for a light scattering problem exhibiting a resonance in the electric field.

Paper Details

Date Published: 23 September 2015
PDF: 14 pages
Proc. SPIE 9630, Optical Systems Design 2015: Computational Optics, 96300R (23 September 2015); doi: 10.1117/12.2190425
Show Author Affiliations
Martin Hammerschmidt, Zuse Institute Berlin (Germany)
Sven Herrmann, Zuse Institute Berlin (Germany)
Jan Pomplun, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Lin Zschiedrich, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Schmidt, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)


Published in SPIE Proceedings Vol. 9630:
Optical Systems Design 2015: Computational Optics
Daniel G. Smith; Frank Wyrowski; Andreas Erdmann, Editor(s)

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