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Proceedings Paper

Ion implantation for figure correction of thin X-ray telescope mirror substrates
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Paper Abstract

Figure correction of X-ray telescope mirrors will be critical for future missions that require high angular resolution and large collecting areas. In this paper, we show that ion implantation offers a method of correcting figure errors by imparting sub-surface in-plane stress in a controllable magnitude and location in Schott D-263 glass, Corning Eagle XG glass, and crystalline silicon substrates. In addition, we can in theory achieve nearly exact corrections in Schott D-263 glass, by controlling the direction of the stress. We show that sufficient stress may be applied to Schott D-263 glass to achieve figure correction in mirrors with simulated initial figure errors. We also report on progress of a system that will be capable of correcting conical shell mirror substrates.

Paper Details

Date Published: 4 September 2015
PDF: 15 pages
Proc. SPIE 9603, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII, 96031K (4 September 2015); doi: 10.1117/12.2189826
Show Author Affiliations
Brandon Chalifoux, Massachusetts Institute of Technology (United States)
Graham Wright, Massachusetts Institute of Technology (United States)
Ralf K. Heilmann, MIT Kavli Institute for Astrophysics and Space Research (United States)
Mark L. Schattenburg, MIT Kavli Institute for Astrophysics and Space Research (United States)


Published in SPIE Proceedings Vol. 9603:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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