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Proceedings Paper

Fabrication and qualification of roughness reference samples for industrial testing of surface roughness levels below 0.5 nm Sq
Author(s): O. Faehnle; E. Langenbach; F. Zygalsky; F. Frost; R. Fechner; A. Schindler; M. Cumme; H. Biskup; C. Wünsche; R. Rascher
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Paper Abstract

Applying reactive ion beam etching (RIBE) processes at the Leibniz Institute of Surface Modification (IOM), several reference samples to be used in industry for calibrating of roughness testing equipment have been generated with the smoothest sample featuring 0.1 nm rms Sq. Subsequently these reference samples have been measured cross-site applying atomic force microscopy (AFM), white light interferometry (WLI), Nomarski1 microscopy (NM) and scatterometry (iTIRM2) determining the appropriate range of measurable rms surface roughness for each industrial measuring device.

Paper Details

Date Published: 27 August 2015
PDF: 6 pages
Proc. SPIE 9575, Optical Manufacturing and Testing XI, 957512 (27 August 2015); doi: 10.1117/12.2189790
Show Author Affiliations
O. Faehnle, FISBA OPTIK AG (Switzerland)
E. Langenbach, FISBA OPTIK AG (Switzerland)
F. Zygalsky, FISBA OPTIK AG (Switzerland)
F. Frost, Leibniz-Institut für Oberflächenmodifizierung e.V. (Germany)
R. Fechner, Leibniz-Institut für Oberflächenmodifizierung e.V. (Germany)
A. Schindler, Leibniz-Institut für Oberflächenmodifizierung e.V. (Germany)
M. Cumme, Carl Zeiss Jena GmbH (Germany)
H. Biskup, Technische Hochschule Deggendorf (Germany)
C. Wünsche, Technische Hochschule Deggendorf (Germany)
R. Rascher, Technische Hochschule Deggendorf (Germany)

Published in SPIE Proceedings Vol. 9575:
Optical Manufacturing and Testing XI
Oliver W. Fähnle; Ray Williamson; Dae Wook Kim, Editor(s)

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