Share Email Print
cover

Proceedings Paper

EUV generation by plasmonic field enhancement using nanostructures
Author(s): Seunghwoi Han; Hyunwoong Kim; Young-Jin Kim; Seung-Woo Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from moderate femtosecond pulses of ~1 x 1011 W/cm2 intensities without auxiliary power amplification, demonstrating a possibility of achieving robust and reproducible EUV sources of the nano-scale for diverse EUV applications for microscopy, lithography and spectroscopy.

Paper Details

Date Published: 17 July 2015
PDF: 4 pages
Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95241S (17 July 2015); doi: 10.1117/12.2189570
Show Author Affiliations
Seunghwoi Han, KAIST (Korea, Republic of)
Hyunwoong Kim, KAIST (Korea, Republic of)
Young-Jin Kim, Nanyang Technological Univ. (Singapore)
Seung-Woo Kim, KAIST (Korea, Republic of)


Published in SPIE Proceedings Vol. 9524:
International Conference on Optical and Photonic Engineering (icOPEN 2015)
Anand K. Asundi; Yu Fu, Editor(s)

© SPIE. Terms of Use
Back to Top