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Proceedings Paper

EUV generation by plasmonic field enhancement using nanostructures
Author(s): Seunghwoi Han; Hyunwoong Kim; Young-Jin Kim; Seung-Woo Kim
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Paper Abstract

Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from moderate femtosecond pulses of ~1 x 1011 W/cm2 intensities without auxiliary power amplification, demonstrating a possibility of achieving robust and reproducible EUV sources of the nano-scale for diverse EUV applications for microscopy, lithography and spectroscopy.

Paper Details

Date Published: 17 July 2015
PDF: 4 pages
Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95241S (17 July 2015); doi: 10.1117/12.2189570
Show Author Affiliations
Seunghwoi Han, KAIST (Korea, Republic of)
Hyunwoong Kim, KAIST (Korea, Republic of)
Young-Jin Kim, Nanyang Technological Univ. (Singapore)
Seung-Woo Kim, KAIST (Korea, Republic of)

Published in SPIE Proceedings Vol. 9524:
International Conference on Optical and Photonic Engineering (icOPEN 2015)
Anand K. Asundi; Yu Fu, Editor(s)

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