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Proceedings Paper

The effect of HF etching on the surface quality and figure of fused silica optics
Author(s): Jiafeng Xu; Xueke Xu; Chaoyang Wei; Wenlan Gao; Minghong Yang; Jianda Shao; Shijie Liu
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Paper Abstract

The effect of deep HF etching on the surface quality and figure of fused silica optics has been investigated systematically. Fused silica samples (100 mm in diameter x 10 mm thick) were manufactured using the conventional grinding and polishing process. These processed samples are etched with different removal depth. Initially, the surface quality of fused silica samples is characterized in terms of surface roughness and surface defects. Many digs not more than 1μm deep are emerged which originates from the micron grinding cracks and crack pits. These digs worsened the surface roughness and frosted the sample. While submillimeter subsurface damage exposed through etching appear as sparkling dots under the high power lamp. The average total length of millimeter scratches on single surfaces is over 200 mm. Not all millimeter scratches could be exposed until removal depth of up to 2 μm. Finally, the surface figure behavior during deep etching has also been figured out. Etching on the edge of the upper surface of samples placed horizontally went faster than on the inside parts. The surface of samples placed vertically assumed a more complicated removal distribution, which can be both explained in terms of "fringe tip effect". For the change of surface figure PV, the initial surface figure feature plays an important role as well as the etching removal distribution.

Paper Details

Date Published: 27 August 2015
PDF: 14 pages
Proc. SPIE 9575, Optical Manufacturing and Testing XI, 95750P (27 August 2015); doi: 10.1117/12.2189079
Show Author Affiliations
Jiafeng Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Xueke Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Shanghai Hengyi Optics and Fine Mechanics Co., Ltd. (China)
Chaoyang Wei, Shanghai Institute of Optics and Fine Mechanics (China)
Wenlan Gao, Shanghai Institute of Optics and Fine Mechanics (China)
Shanghai Hengyi Optics and Fine Mechanics Co., Ltd. (China)
Minghong Yang, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Shijie Liu, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9575:
Optical Manufacturing and Testing XI
Oliver W. Fähnle; Ray Williamson; Dae Wook Kim, Editor(s)

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