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Proceedings Paper

X-ray microscopy for in situ characterization of 3D nanostructural evolution in the laboratory
Author(s): Benjamin Hornberger; Hrishikesh Bale; Arno Merkle; Michael Feser; William Harris; Sergey Etchin; Marty Leibowitz; Wei Qiu; Andrei Tkachuk; Allen Gu; Robert S. Bradley; Xuekun Lu; Philip J. Withers; Amy Clarke; Kevin Henderson; Nikolaus Cordes; Brian M. Patterson
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Paper Abstract

X-ray microscopy (XRM) has emerged as a powerful technique that reveals 3D images and quantitative information of interior structures. XRM executed both in the laboratory and at the synchrotron have demonstrated critical analysis and materials characterization on meso-, micro-, and nanoscales, with spatial resolution down to 50 nm in laboratory systems. The non-destructive nature of X-rays has made the technique widely appealing, with potential for “4D” characterization, delivering 3D micro- and nanostructural information on the same sample as a function of sequential processing or experimental conditions. Understanding volumetric and nanostructural changes, such as solid deformation, pore evolution, and crack propagation are fundamental to understanding how materials form, deform, and perform. We will present recent instrumentation developments in laboratory based XRM including a novel in situ nanomechanical testing stage. These developments bridge the gap between existing in situ stages for micro scale XRM, and SEM/TEM techniques that offer nanometer resolution but are limited to analysis of surfaces or extremely thin samples whose behavior is strongly influenced by surface effects. Several applications will be presented including 3D-characterization and in situ mechanical testing of polymers, metal alloys, composites and biomaterials. They span multiple length scales from the micro- to the nanoscale and different mechanical testing modes such as compression, indentation and tension.

Paper Details

Date Published: 18 September 2015
PDF: 11 pages
Proc. SPIE 9592, X-Ray Nanoimaging: Instruments and Methods II, 95920Q (18 September 2015); doi: 10.1117/12.2188728
Show Author Affiliations
Benjamin Hornberger, Carl Zeiss X-ray Microscopy, Inc. (United States)
Hrishikesh Bale, Carl Zeiss X-ray Microscopy, Inc. (United States)
Arno Merkle, Carl Zeiss X-ray Microscopy, Inc. (United States)
Michael Feser, Carl Zeiss X-ray Microscopy, Inc. (United States)
William Harris, Carl Zeiss X-ray Microscopy, Inc. (United States)
Sergey Etchin, Carl Zeiss X-ray Microscopy, Inc. (United States)
Marty Leibowitz, Carl Zeiss X-ray Microscopy, Inc. (United States)
Wei Qiu, Carl Zeiss X-ray Microscopy, Inc. (United States)
Andrei Tkachuk, Carl Zeiss X-ray Microscopy, Inc. (United States)
Allen Gu, Carl Zeiss X-ray Microscopy, Inc. (United States)
Robert S. Bradley, The Univ. of Manchester (United Kingdom)
Xuekun Lu, The Univ. of Manchester (United Kingdom)
Philip J. Withers, The Univ. of Manchester (United Kingdom)
Amy Clarke, Los Alamos National Lab. (United States)
Kevin Henderson, Los Alamos National Lab. (United States)
Nikolaus Cordes, Los Alamos National Lab. (United States)
Brian M. Patterson, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 9592:
X-Ray Nanoimaging: Instruments and Methods II
Barry Lai, Editor(s)

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