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Proceedings Paper

Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique
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Paper Abstract

Making use of a newly established nanomasking technique, nanoscale features (sub-10 nm) have been fabricated with the potential to act as plasmonic enhancement structures. The technique makes use of a two-step lithography process to simultaneously produce many plasmonic hotspots with two-dimensional features over a large area, showing promise for mass production scalability. This technique is highly reproducible, reliably patterning multiple nanostructures and nanogaps over a potentially wafer-scale area without significantly increasing the number of steps required. Fabrication results show promise for scalability towards applications such as biosensing, photovoltaics, and enhanced spectroscopies.

Paper Details

Date Published: 20 August 2015
PDF: 7 pages
Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560M (20 August 2015); doi: 10.1117/12.2188335
Show Author Affiliations
Stephen J. Bauman, Univ. of Arkansas (United States)
Desalegn T. Debu, Univ. of Arkansas (United States)
Joseph B. Herzog, Univ. of Arkansas (United States)

Published in SPIE Proceedings Vol. 9556:
Nanoengineering: Fabrication, Properties, Optics, and Devices XII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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