Share Email Print

Proceedings Paper

Self-assembly based nanometer-scale patterning for nanowire growth
Author(s): Abhishek Chandramohan; Nikolai Sibirev; Vladimir G. Dubrovskii; Budhika Mendis; Mike C. Petty; Andrew J. Gallant; Dagou A. Zeze
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Periodic nanostructure arrays have been ubiquitously exploited lately due to their properties and prospective applications in production of templates for self-induced and gold (Au)-catalysed nanowires (NWs), because this approach is relatively cheap, time-efficient and do not require electron beam lithography. The technique consists creating nanoholes in SiO2 to expose the silicon Si (111) beneath where self-induced NWs can nucleate, while nanodots deposited onto the Si (111) surface serve as catalyst seeds. For Au-catalysed NWs, a monolayer of self-assembled polystyrene nanospheres (PNS 300nm) was created on a 2 inch Si wafer by spin coating and later etched for a short time before a very thin Au-catalyst layer was deposited. In turn, for self-induced, PNS monolayer was created onto a SiO2-Si substrate. A longer etch was required to reduce PNS diameter significantly to leave relatively larger spacing where chromium is blanket deposited. PNS were lifted off by sonicating the samples in toluene produce the periodic arrays of nanodots and nanoholes, respectively. The underlying SiO2 was etched further through the nanoholes to uncover the Si below. 200 nm holes and 30-70 nm dots were demonstrated through the bespoke methods. The patterned substrates served as master templates, subsequently copied using polydimethylsiloxane (PDMS) to produce a flexible stamp for nanoimprint lithography. A bilayer resist lift off process was developed to print the replicated nanodots or nanoholes on large-area substrates onto which III-V NWs can be grown.

Paper Details

Date Published: 20 August 2015
PDF: 7 pages
Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560T (20 August 2015); doi: 10.1117/12.2188016
Show Author Affiliations
Abhishek Chandramohan, Durham Univ. (United Kingdom)
Nikolai Sibirev, St. Petersburg Academic Univ. (Russian Federation)
Vladimir G. Dubrovskii, St. Petersburg Academic Univ. (Russian Federation)
Budhika Mendis, Durham Univ. (United Kingdom)
Mike C. Petty, Durham Univ. (United Kingdom)
Andrew J. Gallant, Durham Univ. (United Kingdom)
Dagou A. Zeze, Durham Univ. (United Kingdom)

Published in SPIE Proceedings Vol. 9556:
Nanoengineering: Fabrication, Properties, Optics, and Devices XII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

© SPIE. Terms of Use
Back to Top