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Proceedings Paper

Full-frequency sub-nanometer optics fabrication and testing
Author(s): Erlong Miao; Gaowen Wang; Songtao Gao; Yongxin Sui; Huaijiang Yang
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Paper Abstract

Lithography projection objective is one of the most precise optical systems that people ever produced. The required accuracy of the optical elements including surface’s form, mid-frequency and high-frequency are down to nanometer and sub-nanometer, which is a great challenge for optical fabrication and testing. Based on the manufacturing of high NA optical lithography projection objective, the theories and technologies of sub-nanometer optics fabrication and testing are studied and developed. The typical and statistic results of high NA optical lithography objective elements are presented and an optical fabrication and testing line for lithography optics is established.

Paper Details

Date Published: 6 August 2015
PDF: 9 pages
Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95244T (6 August 2015); doi: 10.1117/12.2187648
Show Author Affiliations
Erlong Miao, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Gaowen Wang, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Songtao Gao, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Yongxin Sui, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Huaijiang Yang, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 9524:
International Conference on Optical and Photonic Engineering (icOPEN 2015)
Anand K. Asundi; Yu Fu, Editor(s)

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