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Proceedings Paper

Measuring skew in average surface roughness as a function of surface preparation
Author(s): Mark T. Stahl
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Paper Abstract

Characterizing surface roughness is important for predicting optical performance. Better measurement of surface roughness reduces polishing time, saves money and allows the science requirements to be better defined. This study characterized statistics of average surface roughness as a function of polishing time. Average surface roughness was measured at 81 locations using a Zygo® white light interferometer at regular intervals during the polishing process. Each data set was fit to a normal and Largest Extreme Value (LEV) distribution; then tested for goodness of fit. We show that the skew in the average data changes as a function of polishing time.

Paper Details

Date Published: 27 August 2015
PDF: 9 pages
Proc. SPIE 9575, Optical Manufacturing and Testing XI, 95750J (27 August 2015); doi: 10.1117/12.2187535
Show Author Affiliations
Mark T. Stahl, NASA Marshall Space Flight Ctr. (United States)


Published in SPIE Proceedings Vol. 9575:
Optical Manufacturing and Testing XI
Oliver W. Fähnle; Ray Williamson; Dae Wook Kim, Editor(s)

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