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Proceedings Paper

High-resolution gravure printed lines: proximity effects and design rules
Author(s): Gerd Grau; William J. Scheideler; Vivek Subramanian
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Paper Abstract

Gravure printing is a very promising method for printed electronics because it combines high throughput with high resolution. Recently, printed lines with 2μm resolution have been demonstrated at printing speeds on the order of 1m/s. Here we build on these results to study how more complex patterns can be printed that will ultimately lead to printed circuits. We study how the drag-out effect leads to proximity effects in gravure when multiple lines are printed close to each other. Drag-out occurs as the doctor blade passes over the roll surface to remove excess ink from the land areas in between the cells that make up the pattern. In addition to this desirable removal of excess ink, some ink from the cells also wicks up the doctor blade and is removed from the cells. This ink is subsequently deposited on the land area behind the cells leading to characteristic drag-out tails. If multiple lines, oriented perpendicular to the print direction, are printed close to each other, the ink that has wicked up the doctor blade from the first line will affect the drag-out process for subsequent lines. Here we show how this effect can be used to enhance print quality of lines as well as how it can deteriorate print quality. Important variables that will determine the regime for printing optimization are ink viscosity, printing speed, cell size, cell spacing and relative placement of lines. Considering these factors carefully allows one to determine design rules for optimal printing results.

Paper Details

Date Published: 17 September 2015
PDF: 8 pages
Proc. SPIE 9569, Printed Memory and Circuits, 95690B (17 September 2015); doi: 10.1117/12.2187274
Show Author Affiliations
Gerd Grau, Univ. of California, Berkeley (United States)
William J. Scheideler, Univ. of California, Berkeley (United States)
Vivek Subramanian, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 9569:
Printed Memory and Circuits
Emil J. W. List Kratochvil, Editor(s)

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