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Proceedings Paper

Nanofabrication at 1nm resolution by quantum optical lithography (Presentation Recording)
Author(s): Eugen Pavel
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Paper Abstract

A major problem in the optical lithography was the diffraction limit. Here, we report and demonstrate a lithography method, Quantum Optical Lithography [1,2], able to attain 1 nm resolution by optical means using new materials (fluorescent photosensitive glass-ceramics and QMC-5 resist). The performance is several times better than that described for any optical or Electron Beam Lithography (EBL) methods. In Fig. 1 we present TEM images of 1 nm lines recorded at 9.6 m/s. a) b) Fig. 1 TEM images of: a) multiple 1 nm lines written in a fluorescent photosensitive glass-ceramics sample; b) single 1 nm line written in QMC-5 resist. References [1] E. Pavel, S. Jinga, B.S. Vasile, A. Dinescu, V. Marinescu, R. Trusca and N. Tosa, “Quantum Optical Lithography from 1 nm resolution to pattern transfer on silicon wafer“, Optics and Laser Technology, 60 (2014) 80-84. [2] E. Pavel, S. Jinga, E. Andronescu, B.S. Vasile, G. Kada, A. Sasahara, N. Tosa, A. Matei, M. Dinescu, A. Dinescu and O.R. Vasile, “2 nm Quantum Optical Lithography“, Optics Communications,291 (2013) 259–263

Paper Details

Date Published: 5 October 2015
PDF: 1 pages
Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560L (5 October 2015); doi: 10.1117/12.2187249
Show Author Affiliations
Eugen Pavel, Storex Technologies Inc. (Romania)

Published in SPIE Proceedings Vol. 9556:
Nanoengineering: Fabrication, Properties, Optics, and Devices XII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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