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Proceedings Paper

Development of plasmonic isolator for integration into photonic integrated circuits (Presentation Recording)
Author(s): Vadym Zayets; Hidekazu Saito; Koji Ando; Shinji Yuasa

Paper Abstract

An optical isolator is an important component of an optical network. At present, there is a significant commercial demand for an optical isolator, which can be integrated into the Photonic Integrated Circuits (PIC). A new design of an integrated optical isolator, which utilizes unique non-reciprocal properties of surface plasmons, has been proposed [1]. The main obstacle for a practical realization of the proposed design is a substantial propagation loss of the surface plasmons in structures containing a ferromagnetic metal. The reduction of the propagation loss of a surface plasmon is the key to make the plasmonic isolator competitive with other designs of the integrated isolator. We studied experimentally optical and magneto-optical properties of a Fe plasmonic waveguide integrated with an AlGaAs rib waveguides and a Co plasmonic waveguide integrated with Si nanowire waveguides. It was demonstrated experimentally that by utilizing a double-dielectric plasmonic waveguide it is possible to reduce significantly the optical loss in a plasmonic waveguide. For Fe/SiO2/AlGaAs double-dielectric plasmonic waveguide the low optical loss of 0.03 dB/um is obtained. As far as we know at present it is a lowest optical loss demonstrated for a plasmon propagating at a surface of a ferromagnetic metal. For Co/Ti2O3/SiO2 double-dielectric plasmonic waveguide integrated with a Si nanowire waveguide on a Si substrate the optical loss of 0.7 dB/um was demonstrated. The designs of the plasmonic isolator utilizing a ring resonator or a non-reciprocal coupler were studied. [1] V. Zayets, H. Saito, S. Yuasa, and K. Ando,, Materials 5, 857 (2012).

Paper Details

Date Published: 5 October 2015
PDF: 1 pages
Proc. SPIE 9551, Spintronics VIII, 955121 (5 October 2015); doi: 10.1117/12.2187166
Show Author Affiliations
Vadym Zayets, National Institute of Advanced Industrial Science and Technology (Japan)
Hidekazu Saito, National Institute of Advanced Industrial Science and Technology (Japan)
Koji Ando, National Institute of Advanced Industrial Science and Technology (Japan)
Shinji Yuasa, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 9551:
Spintronics VIII
Henri-Jean Drouhin; Jean-Eric Wegrowe; Manijeh Razeghi, Editor(s)

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