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Proceedings Paper

All-polymer based fabrication process for an all-polymer flexible and parallel optical interconnect
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Paper Abstract

We proposed and demonstrated a new all-polymer based fabrication process for an all-polymer flexible and parallel optical interconnect cable in which a vertical light coupler is integrated. The approach potentially cut down the cost by eliminating a metallization process for alignment of multiple masks. Throughout the process we used a polyimide as the substrate, coated by Epoclad as claddings, then AP2210B and WPR 5100 were used to fabricate waveguides and 45 degree mirror couplers, respectively. In addition, precisely aligned mirror couplers to waveguides are achieved by using polymer-based, non-metallic, and transparent phase-based alignment marks. We tested a feature specific phase-based alignment system. In addition, the shape and depth of the phase-based alignment marks are optimized for phase contrast and Schlieren imaging. Our results shows that a contrast of the image is enhanced compared to that of observed by a conventional imaging system. Such process enables to integrate polymer based waveguides by only using the polymer based alignment marks on the WPR 5100 layer.

Paper Details

Date Published: 20 August 2015
PDF: 8 pages
Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560F (20 August 2015); doi: 10.1117/12.2187143
Show Author Affiliations
Jilin Yang, College of Optical Sciences, The Univ. of Arizona (United States)
Tao Ge, College of Optical Sciences, The Univ. of Arizona (United States)
Chris Summitt, College of Optical Sciences, The Univ. of Arizona (United States)
Sunglin Wang, College of Optical Sciences, The Univ. of Arizona (United States)
Tom Milster, College of Optical Sciences, The Univ. of Arizona (United States)
Yuzuru Takashima, College of Optical Sciences, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 9556:
Nanoengineering: Fabrication, Properties, Optics, and Devices XII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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