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Proceedings Paper

Plasma-etched nanostructures for optical applications (Presentation Recording)
Author(s): Ulrike Schulz; Friedrich Rickelt; Peter Munzert; Norbert Kaiser
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Paper Abstract

A basic requirement for many optical applications is the reduction of Fresnel-reflections. Besides of interference coatings, nanostructures with sub-wavelength size as known from the eye of the night-flying moth can provide antireflective (AR) properties. The basic principle is to mix a material with air on a sub-wavelength scale to decrease the effective refractive index. To realize AR nanostructures on polymers, the self-organized formation of stochastically arranged antireflective structures using a low-pressure plasma etching process was studied. An advanced procedure involves the use of additional deposition of a thin oxide layer prior etching. A broad range of different structure morphologies exhibiting antireflective properties can be generated on almost all types of polymeric materials. For applications on glass, organic films are used as a transfer medium. Organic layers as thin film materials were evaluated to identify compounds suitable for forming nanostructures by plasma etching. The vapor deposition and etching of organic layers on glass offers a new possibility to achieve antireflective properties in a broad spectral range and for a wide range of light incidence.

Paper Details

Date Published: 5 October 2015
PDF: 1 pages
Proc. SPIE 9558, Nanostructured Thin Films VIII, 95580G (5 October 2015); doi: 10.1117/12.2186993
Show Author Affiliations
Ulrike Schulz, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Friedrich Rickelt, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Peter Munzert, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

Published in SPIE Proceedings Vol. 9558:
Nanostructured Thin Films VIII
Akhlesh Lakhtakia; Tom G. Mackay; Motofumi Suzuki, Editor(s)

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